ASTM F1709-1997(2008) 电子薄膜用高纯度钛溅射靶机的标准规范

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【英文标准名称】:StandardSpecificationforHighPurityTitaniumSputteringTargetsforElectronicThinFilmApplications
【原文标准名称】:电子薄膜用高纯度钛溅射靶机的标准规范
【标准号】:ASTMF1709-1997(2008)
【标准状态】:现行
【国别】:美国
【发布日期】:1997
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:F01.17
【标准类型】:(Specification)
【标准水平】:()
【中文主题词】:
【英文主题词】:coating;sputtering;target;thinfilm;titanium;Electronicmaterials/applications--specifications;Electronicthin-filmapplications--specifications;High-puritytitanium;Sputteringprocess/targets--specifications;Thinfilmapplications;Titanium
【摘要】:1.1Thisspecificationcoverspuretitaniumsputteringtargetsusedasarawmaterialinfabricatingsemiconductorelectronicdevices.1.2Thisstandardsetspuritygradelevels,physicalattributes,analyticalmethods,andpackaging.1.2.1Thegradedesignationisameasureoftotalmetallicimpuritycontent.Thegradedesignationdoesnotnecessarilyindicatesuitabilityforaparticularapplicationbecausefactorsotherthantotalmetallicimpuritymayinfluenceperformance.
【中国标准分类号】:L90
【国际标准分类号】:31_120
【页数】:3P.;A4
【正文语种】:英语